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Proceedings Paper

Benchmark study of mask writer lithography systems
Author(s): Lawrence Weins; Wayne Smith
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Paper Abstract

SEMATECH has conducted a mask writer benchmark study in order to provide a description of the lithographic capability of the mask writer industry. Systems claimed by their manufacturers to have the ability to support 0.35 um or better lithography groundrules in a manufacturing environment were the focus of this study. The study describes the average performance and identifies any significant differences in capability among the various mask writer tools. The benchmarking was conducted as a blind study. Participant identity was protected by using the services of Arthur Anderson & Co. The parameters described in this paper include critical dimension (CD) control, registration, overlay (two plates), and throughput. Results of the study show that no participant consistently demonstrated the 50 nm CD uniformity performance required by the 1995 SIA roadmap for 0.35 um lithography. However, half the participants were able to demonstrate registration performance consistent with the Roadmap requirement of 70 nm 3 sigma. While throughput results varied greatly, one participant demonstrated superior capability.

Paper Details

Date Published: 27 December 1996
PDF: 9 pages
Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262813
Show Author Affiliations
Lawrence Weins, SEMATECH (United States)
Wayne Smith, SEMATECH (United States)


Published in SPIE Proceedings Vol. 2884:
16th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James A. Reynolds, Editor(s)

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