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Proceedings Paper

Contamination removal from photomasks using a dry laser-assisted cleaning technology
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Paper Abstract

Photomask manufacturing for sub-0.5 micron ICs faces two principal challenges: efficient cleaning within cycle time requirements and minimization of water and chemical usage. A new technology using only deep ultraviolet photons and a flowing inert gas cleans state-of-the-art optical and x-ray photomasks. The technology uses no water or chemicals. Tools can handle single or multiple substrate sizes. There is no optical reflectivity change in the chrome. No damage is observed on chrome patterns from either backside or front side exposure whether the features are positioned horizontally or vertically. Our work to date indicates that this technology meets the cycle time requirements in the photomask manufacturing process.

Paper Details

Date Published: 27 December 1996
PDF: 11 pages
Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); doi: 10.1117/12.262798
Show Author Affiliations
Audrey C. Engelsberg, Radiance Services Co. (United States)

Published in SPIE Proceedings Vol. 2884:
16th Annual BACUS Symposium on Photomask Technology and Management
Gilbert V. Shelden; James A. Reynolds, Editor(s)

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