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Proceedings Paper

Codoped silica-on-silicon waveguides fabricated by PECVD technique
Author(s): A. M. Fiorello; E. Giannetta; M. Valentino; A. Vannucci; Mauro Varasi
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Paper Abstract

Silica-on-silicon waveguides have been fabricated doping core layer with phosphorus and germanium. Plasma Enhanced Chemical Vapor Deposition has been used to grow all layers starting from liquid metalorganic compounds. Co-doping assures chemical (Ge) and geometrical (P) homogeneity with optical fibers and allows to propagation losses of 1 dB/cm (not reflowed samples). Low cost, high realization rate and process compatibility with other microelectronic components make this technology very attractive for industrial production.

Paper Details

Date Published: 20 December 1996
PDF: 7 pages
Proc. SPIE 2954, Fiber Integrated Optics, (20 December 1996); doi: 10.1117/12.262436
Show Author Affiliations
A. M. Fiorello, Alenia (Italy)
E. Giannetta, Alenia (Italy)
M. Valentino, Alenia (Italy)
A. Vannucci, Alenia (Italy)
Mauro Varasi, Alenia (Italy)

Published in SPIE Proceedings Vol. 2954:
Fiber Integrated Optics
Giancarlo C. Righini, Editor(s)

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