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Proceedings Paper

Resonant IR laser-induced diffusion of oxygen in silicon
Author(s): M. V. Artsimovich; A. N. Baranov; V. V. Krivov; Eugene M. Kudriavtsev; Emma N. Lotkova; B. H. Makeev; I. F. Mogilnik; V. N. Pavlovich; B. N. Romanuk; V. I. Soroka; V. V. Tokarevski; Sergey D. Zotov
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Paper Details

Date Published: 1 February 1991
PDF: 5 pages
Proc. SPIE 1397, 8th Intl Symp on Gas Flow and Chemical Lasers, (1 February 1991); doi: 10.1117/12.26001
Show Author Affiliations
M. V. Artsimovich, Institute for Nuclear Research (Ukraine)
A. N. Baranov, P. N. Lebedev Physical Institute (Russia)
V. V. Krivov, P. N. Lebedev Physical Institute (Russia)
Eugene M. Kudriavtsev, P. N. Lebedev Physical Institute (Russia)
Emma N. Lotkova, P. N. Lebedev Physical Institute (Russia)
B. H. Makeev, P. N. Lebedev Physical Institute (Russia)
I. F. Mogilnik, Institute for Nuclear Research (Ukraine)
V. N. Pavlovich, Institute for Nuclear Research (Ukraine)
B. N. Romanuk, Institute of Semiconductors (Ukraine)
V. I. Soroka, Institute for Nuclear Research (Ukraine)
V. V. Tokarevski, Institute for Nuclear Research (Ukraine)
Sergey D. Zotov, P. N. Lebedev Physical Institute (Russia)


Published in SPIE Proceedings Vol. 1397:
8th Intl Symp on Gas Flow and Chemical Lasers

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