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Proceedings Paper

Reactive-flow modeling of the H/NF2/BiF reaction system
Author(s): Robert Acebal; Jeffrey P. Dansereau; Randy C.R. Jones; Robert J. Malins; H. Schreiber; William S. Smith; S. Taylor; William Anthony Duncan; Stanley P. Patterson
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Paper Abstract

The H/NF2/BiF system is one of the most promising concepts for high-power short wavelength chemical lasers (SWCL). The preferred approach uses the H + NF2 reaction to efficiently generate NF(a) energy-carrier molecules. These latter species interact with Bi compounds to produce excited BiF. The potential lasing transition is BiF(A-X) emitting near 460 nm. We report in this paper one-dimensional (1-D) reactive-flow modeling of the H/NF2/BiF system. This work supports design of an experimental demonstration of continuous-wave lasing in a supersonic-flow, purely chemical system. The model treats the subsonic plenum, transonic throat, and supersonic expansion regions.

Paper Details

Date Published: 1 February 1991
PDF: 6 pages
Proc. SPIE 1397, 8th Intl Symp on Gas Flow and Chemical Lasers, (1 February 1991); doi: 10.1117/12.25989
Show Author Affiliations
Robert Acebal, Science Applications International Corp. (United States)
Jeffrey P. Dansereau, Science Applications International Corp. (United States)
Randy C.R. Jones, Science Applications International Corp. (United States)
Robert J. Malins, Science Applications International Corp. (United States)
H. Schreiber, Science Applications International Corp. (United States)
William S. Smith, Science Applications International Corp. (United States)
S. Taylor, Science Applications International Corp. (United States)
William Anthony Duncan, U.S. Army (United States)
Stanley P. Patterson, U.S. Army (United States)


Published in SPIE Proceedings Vol. 1397:
8th Intl Symp on Gas Flow and Chemical Lasers

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