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Proceedings Paper

New x-y stage for precision positioning and scanning
Author(s): Paul D. Atherton; Ying Xu; Malachy McConnell
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Paper Abstract

In recent years there has been an increasing need of ultra precision positioning and scanning systems with nanometer, or even subnanometer, resolution and accuracy. To meet the demand requires the development of new design concepts and techniques. A newly developed x-y stage is introduced in the paper. The stage was mainly designed for applications in SPMs, with subnanometer resolution and equivalent repeatability over a 50 by 50 micrometers scanning range. The yaw, roll and pitch errors of the stage are 2 arcsec., 0.8 arcsec., and 0.8 arcsec., respectively for the whole range. Some design considerations, such as stiffness, settling time and distortion of the frame are discussed. The experimental results are presented and its application in SPM demonstrated.

Paper Details

Date Published: 20 November 1996
PDF: 6 pages
Proc. SPIE 2865, Actuator Technology and Applications, (20 November 1996); doi: 10.1117/12.259035
Show Author Affiliations
Paul D. Atherton, Queensgate Instruments Ltd. (United Kingdom)
Ying Xu, Queensgate Instruments Ltd. (United Kingdom)
Malachy McConnell, Queensgate Instruments Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 2865:
Actuator Technology and Applications
Alson E. Hatheway, Editor(s)

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