Share Email Print
cover

Proceedings Paper

Lens for microlithography
Author(s): Hung-yu Hsieh; Jerome F. Wagner
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

With the help of CODE V (a powerful tool for lens design) a fourteen element and two cemented doublet lens system with 0. 2 Reduction rate (Red) 10 cm field diameter 0. 32 numerical aperwre (NA) was obtained. The criteria for a microlithographic lens system applied to the lens will be discussed. 1.

Paper Details

Date Published: 1 March 1991
PDF: 6 pages
Proc. SPIE 1396, Applications of Optical Engineering: Proceedings of OE/Midwest '90, (1 March 1991); doi: 10.1117/12.25845
Show Author Affiliations
Hung-yu Hsieh, Rose-Hulman Institute of Technology (United States)
Jerome F. Wagner, Rose-Hulman Institute of Technology (United States)


Published in SPIE Proceedings Vol. 1396:
Applications of Optical Engineering: Proceedings of OE/Midwest '90

© SPIE. Terms of Use
Back to Top