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Proceedings Paper

Color AC plasma panel barrier measurement system
Author(s): John W. V. Miller; Timothy A. Kohler; Behrouz N. Shabestari; R. Sweney
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Paper Abstract

A system for measuring barriers in a color AC plasma panel has been developed. Barriers are used in this type of display to prevent phosphors in cells adjacent to lit cells from being excited which adversely affects color purity. The geometry of the barriers is a significant factor for successful operation of color plasma panels and must be measured to verify that the barriers are within specifications. Barrier height is on the order of several mils with a pitch on the order of about 10 mils. A system developed for spacer measurements was available for this application. However, it did not have sufficient light sensitivity because the barriers reflect light much less efficiently than traditional panels. The original system employed a light section microscope for height measurement. The video amplifier gain was boosted significantly in the frame grabber and frame integration was provided to reduce noise. Finally, background subtraction was provided to remove shading variations associated with the normally insignificant dark current of the CCD sensor. Once a good image had been obtained, morphological processing was performed to reduce noise and centroid calculations were performed to provide an accurate measure of the barrier surface height.

Paper Details

Date Published: 31 October 1996
PDF: 5 pages
Proc. SPIE 2908, Machine Vision Applications, Architectures, and Systems Integration V, (31 October 1996); doi: 10.1117/12.257273
Show Author Affiliations
John W. V. Miller, Edison Industrial Systems Ctr. (United States)
Timothy A. Kohler, Edison Industrial Systems Ctr. (United States)
Behrouz N. Shabestari, Edison Industrial Systems Ctr. (United States)
R. Sweney, Electro Plasma, Inc. (United States)


Published in SPIE Proceedings Vol. 2908:
Machine Vision Applications, Architectures, and Systems Integration V
Susan Snell Solomon; Bruce G. Batchelor; Frederick M. Waltz, Editor(s)

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