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Proceedings Paper

High-dose boron implantation and RTP anneal of polysilicon films for shallow junction diffusion sources and interconnects
Author(s): Bruha Raicu; W. Andrew Keenan; Michael I. Current; David Mordo; Roger Brennan
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Paper Details

Date Published: 1 April 1991
PDF: 11 pages
Proc. SPIE 1393, Rapid Thermal and Related Processing Techniques, (1 April 1991); doi: 10.1117/12.25726
Show Author Affiliations
Bruha Raicu, Integrated Technology Associates (United States)
W. Andrew Keenan, Prometrix Corp. (United States)
Michael I. Current, Applied Materials, Inc. (United States)
David Mordo, A.G. Associates (United States)
Roger Brennan, Solecon Labs., Inc. (United States)

Published in SPIE Proceedings Vol. 1393:
Rapid Thermal and Related Processing Techniques
Rajendra Singh; Mehrdad M. Moslehi, Editor(s)

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