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Proceedings Paper

Adaptive process control for a rapid thermal processor
Author(s): Jean-Marie R. Dilhac; Christian Ganibal; J. Bordeneuve; B. Dahhou; L. Amat; Antoni Picard
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Paper Abstract

PD (Proportional Integrated Derivative) controllers applied to temperature regulation in a rapid thermal processor are first presented. The setting method of the control parameters together with the corresponding experimental results is given. Evidence in favour of parameter dynamic adjustment is demonstrated. A new algorithm based upon parameter scheduling and providing enlarged control capability is then presented and tested with various wafers and processors. At last insights about closed loop self-tuning using Generalized Predictive Control algorithm are given and the corresponding results discussed. 1.

Paper Details

Date Published: 1 April 1991
PDF: 9 pages
Proc. SPIE 1393, Rapid Thermal and Related Processing Techniques, (1 April 1991); doi: 10.1117/12.25722
Show Author Affiliations
Jean-Marie R. Dilhac, Lab. d'Automatique et d'Analyse des Systemes/CNRS (France)
Christian Ganibal, Lab. d'Automatique et d'Analyse des Systemes/CNRS (France)
J. Bordeneuve, Lab.d'Automatique et d'Analyse des Systemes/CNRS (France)
B. Dahhou, Lab. d'Automatique et d'Analyse des Systemes/CNRS (France)
L. Amat, Lab. d'Automatique et d'Analyse des Systemes/CNRS (France)
Antoni Picard, SITESA-ADDAX (Germany)


Published in SPIE Proceedings Vol. 1393:
Rapid Thermal and Related Processing Techniques
Rajendra Singh; Mehrdad M. Moslehi, Editor(s)

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