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Proceedings Paper

Si-based epitaxial growth by rapid thermal processing chemical vapor deposition
Author(s): Kissoo H. Jung; T. Y. Hsieh; Dim-Lee Kwong; D. B. Spratt
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Paper Details

Date Published: 1 April 1991
PDF: 12 pages
Proc. SPIE 1393, Rapid Thermal and Related Processing Techniques, (1 April 1991); doi: 10.1117/12.25709
Show Author Affiliations
Kissoo H. Jung, Univ. of Texas/Austin (United States)
T. Y. Hsieh, Univ. of Texas/Austin (United States)
Dim-Lee Kwong, Univ. of Texas/Austin (United States)
D. B. Spratt, Texas Instruments Inc. (United States)

Published in SPIE Proceedings Vol. 1393:
Rapid Thermal and Related Processing Techniques
Rajendra Singh; Mehrdad M. Moslehi, Editor(s)

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