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Proceedings Paper

Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography
Author(s): Sergey V. Babin; Mark A. Weber; Hans W. P. Koops
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Paper Abstract

The fabrication of microlenses on flat and three-dimensional substrates is described. A totally dry resist process is used. The characteristics of this novel process are investigated. A technique for lens positioning and exposure was developed for a scanning electron microscope using an image processor as a beam control system. The hyperbolic profile of the microlenses is computer generated. Microlenses of cylindrical, round, and elliptical geometry were fabricated on a Si wafer and on the end of a monomode quartz fiber. Focusing of infrared light by fabricated microlenses is demonstrated.

Paper Details

Date Published: 1 November 1996
PDF: 7 pages
Proc. SPIE 2863, Current Developments in Optical Design and Engineering VI, (1 November 1996); doi: 10.1117/12.256212
Show Author Affiliations
Sergey V. Babin, Deutsche Telekom AG (United States)
Mark A. Weber, Deutsche Telekom AG (Germany)
Hans W. P. Koops, Deutsche Telekom AG (Germany)


Published in SPIE Proceedings Vol. 2863:
Current Developments in Optical Design and Engineering VI
Robert E. Fischer; Warren J. Smith, Editor(s)

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