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Proceedings Paper

Application of off-specular x-ray reflectivity for surface characterization
Author(s): Wen-li Wu
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Paper Abstract

A scheme based on the distorted wave Born approximation has been developed to model the off-specular x-ray reflectivity from flat surfaces with compositional and topographic fluctuations. To verify this theoretical work, silicon wafers coated with evenly spaced aluminum lines were chosen as the test samples. Good agreement is found between the calculationed and the experimental results. In addition, a gross difference in the off-specular spectra was observed from two test samples different only in their surface roughness; this observation demonstrates the potential of using off-specular x-ray reflectivity for quality control measurements.

Paper Details

Date Published: 4 November 1996
PDF: 10 pages
Proc. SPIE 2862, Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays, (4 November 1996); doi: 10.1117/12.256208
Show Author Affiliations
Wen-li Wu, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 2862:
Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays
John C. Stover, Editor(s)

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