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Proceedings Paper

Surface haze in the Stokes-Mueller representation
Author(s): Eugene L. Church; John C. Stover
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Paper Abstract

This paper derives the Mueller scattering matrices for two topographic scattering models--the Rayleigh-Rice or perturbation model and the geometrical-optics or facet model. The results are used to predict the polarimetric properties of the `haze' on silicon-wafer surfaces.

Paper Details

Date Published: 4 November 1996
PDF: 15 pages
Proc. SPIE 2862, Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays, (4 November 1996); doi: 10.1117/12.256191
Show Author Affiliations
Eugene L. Church, ADE Optical Systems (United States)
John C. Stover, ADE Optical Systems (United States)


Published in SPIE Proceedings Vol. 2862:
Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays
John C. Stover, Editor(s)

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