Share Email Print
cover

Proceedings Paper

Improved resolution in field-emission lithography machines
Author(s): Tom Chisholm; Bernard A. Wallman; Haoning Liu; Eric Munro; John A. Rouse; Xieqing Zhu
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The electron-optical design of the Leica Vectorbeam Series lithography tool has been modified to reduce the writing spot-size to 2.5 nm; this has required two separate design approaches. Firstly, the current transmitted from the Schottky-emission source module into the column has been reduced from 500 to 25 nA. This makes stochastic beam broadening due to electron-electron interactions negligible. Secondly, a new final lens was designed with sufficiently small aberrations to achieve the desired spot-size. The design includes secondary electron detectors as well as the more usual back-scattered electron detectors. The conversion of the theoretical electron-optical design to reality has been greatly facilitated by the use of CAD solid modelling techniques.

Paper Details

Date Published: 25 October 1996
PDF: 10 pages
Proc. SPIE 2858, Charged-Particle Optics II, (25 October 1996); doi: 10.1117/12.255505
Show Author Affiliations
Tom Chisholm, Leica Lithography Systems Ltd. (United Kingdom)
Bernard A. Wallman, Leica Lithography Systems Ltd. (United Kingdom)
Haoning Liu, Munro's Electron Beam Software Ltd. (United Kingdom)
Eric Munro, Munro's Electron Beam Software Ltd. (United Kingdom)
John A. Rouse, Munro's Electron Beam Software Ltd. (United Kingdom)
Xieqing Zhu, Munro's Electron Beam Software Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 2858:
Charged-Particle Optics II
Eric Munro, Editor(s)

© SPIE. Terms of Use
Back to Top