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Proceedings Paper

100-kV electron gun for the x-ray mask writer EB-X2
Author(s): Kenichi Saito; Junichi Kato; Nobuo Shimazu; Akira Shimizu
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Paper Abstract

This paper describes a 100-kV thermal-emission electron gun developed for the X-ray mask writer, EB-X2, which employs a variable-shaped electron beam with a beam edge resolution of 20 nm. The optimized design of the EB-X2 electron optical system requires that the electron gun have crossover diameters of 50 micrometers and an optical length of less than 100 mm. So the crossover diameters of the gun were accurately calculated with an electron ray tracing program, and a gun with the required crossover diameters and optical length was designed. The gun was constructed, and the crossover diameters were measured. The measured values agree well with the calculated ones, and this confirms that the gun is suitable for use in the EB-X2 electron optical system.

Paper Details

Date Published: 25 October 1996
PDF: 11 pages
Proc. SPIE 2858, Charged-Particle Optics II, (25 October 1996); doi: 10.1117/12.255500
Show Author Affiliations
Kenichi Saito, NTT LSI Labs. (Japan)
Junichi Kato, NTT LSI Labs. (Japan)
Nobuo Shimazu, NTT LSI Labs. (Japan)
Akira Shimizu, NTT LSI Labs. (Japan)


Published in SPIE Proceedings Vol. 2858:
Charged-Particle Optics II
Eric Munro, Editor(s)

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