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Proceedings Paper

Grating-tuned semiconductor MOPA lasers for precision spectroscopy
Author(s): John H. Marquardt; Flavio C. Cruz; Michelle Stephens; Chris W. Oates; Leo W. Hollberg; James C. Bergquist; David F. Welch; David G. Mehuys; Steve Sanders
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Paper Abstract

A standard grating-tuned extended-cavity diode laser is used for injection seeding of a tapered semiconductor laser/amplifier. With sufficient injection power the output of the amplifier takes on the spectral characteristics of the master laser. We have constructed master-oscillator power-amplifier systems that operator near 657 nm, 675 nm, 795 nm, and 850 nm. Although the characteristics vary from system to system, we have demonstrated output powers of greater than 700 mW in a single spatial mode, linewidths less than 1 kHz, coarse tuning greater than 20 nm, and continuous single-frequency scanning greater than 150 GHz. We discuss the spectroscopic applications of these high power, highly coherent, tunable diode lasers as applied to Ca, Hg+, I2, and two-photon transitions in Cs.

Paper Details

Date Published: 21 October 1996
PDF: 7 pages
Proc. SPIE 2834, Application of Tunable Diode and Other Infrared Sources for Atmospheric Studies and Industrial Process Monitoring, (21 October 1996); doi: 10.1117/12.255336
Show Author Affiliations
John H. Marquardt, National Institute of Standards and Technology (United States)
Flavio C. Cruz, National Institute of Standards and Technology (United States)
Michelle Stephens, National Institute of Standards and Technology (United States)
Chris W. Oates, National Institute of Standards and Technology (United States)
Leo W. Hollberg, National Institute of Standards and Technology (United States)
James C. Bergquist, National Institute of Standards and Technology (United States)
David F. Welch, SDL, Inc. (United States)
David G. Mehuys, SDL, Inc. (United States)
Steve Sanders, SDL, Inc. (United States)


Published in SPIE Proceedings Vol. 2834:
Application of Tunable Diode and Other Infrared Sources for Atmospheric Studies and Industrial Process Monitoring
Alan Fried, Editor(s)

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