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Proceedings Paper • Open Access • new

Machine learning for predictive electrical performance using OCD (Erratum)

Paper Abstract

This paper, originally published on 26 March 2019, was replaced with a corrected/revised version on 25 June 2019. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Customer Service for assistance.

Paper Details

Date Published: 25 June 2019
PDF: 1 pages
Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 1095932 (25 June 2019); doi: 10.1117/12.2541616
Show Author Affiliations
Sayantan Das, IMEC (Belgium)
Joey Hung, Nova Measuring Instruments Ltd. (Belgium)
Sandip Halder, IMEC (Belgium)
Guillaume Schelcher, IMEC (Belgium)
Roy Koret, Nova Measuring Instruments Ltd. (Israel)
Igor Turovets, Nova Measuring Instruments Ltd. (Israel)
Mohamed Saib, IMEC (Belgium)
Anne-Laure Charley, IMEC (Belgium)
Matthew J. Sendelbach, Nova Measuring Instruments Inc. (United States)
Avron Ger, Nova Measuring Instruments Ltd. (Israel)
Philippe Leray, IMEC (Belgium)


Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)

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