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Annealing effects on the optical and structural properties of Y2O3 thin films deposited by thermal evaporation technique
Author(s): Shida Li; Huasong Liu; Yugang Jiang; Meiping Zhu; Dan Chen; Xiao Yang; Lishuan Wang; Jiahuan He; Dongbai Xue
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Paper Abstract

Yttrium oxide (Y2O3) thin films has been prepared on glass substrates at room temperature by thermal evaporation technique using Y2O3 powders (99% purity) and then are annealed at different temperatures ranging from 150℃ to 450℃ for 24 hours in air. The effects of the annealing temperatures on the structural and optical properties of the Y2O3 thin films were studied. The results show that the refractive index, extinction coefficient and forbidden band width of the Y2O3 thin film change to different degrees with the increase of annealing temperature. In addition, the roughness and stress of the Y2O3 thin film showed a trend of increasing first and then decreasing. The crystal state of the film is improved, indicating that the grain size becomes large. The research indicates that annealing treatment can effectively change the optical properties and structural properties of the Y2O3 thin films which has guiding significance for the selection of optimal heat treatment temperature for Y2O3 film modification.

Paper Details

Date Published: 8 July 2019
PDF: 9 pages
Proc. SPIE 11064, Tenth International Conference on Thin Film Physics and Applications (TFPA 2019), 1106415 (8 July 2019); doi: 10.1117/12.2539549
Show Author Affiliations
Shida Li, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)
Huasong Liu, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)
Yugang Jiang, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)
Meiping Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Dan Chen, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)
Xiao Yang, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)
Lishuan Wang, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)
Jiahuan He, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)
Dongbai Xue, Tianjin Jinhang Institute of Technical Physics (China)
Joint Lab. of Optoelectronic Materials and Intelligent Surface Structures (China)


Published in SPIE Proceedings Vol. 11064:
Tenth International Conference on Thin Film Physics and Applications (TFPA 2019)
Junhao Chu; Jianda Shao, Editor(s)

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