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Fast measurement technique for obtaining the low damage threshold defects in a large aperture fused silica glass
Author(s): Shenghao Wang; Lingqiao Li; Zhan Sui; Jianda Shao; Shijie Liu; Zhouling Wu; Jian Chen; Ming Huang
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Paper Abstract

Measurement of the low damage threshold defects in a large aperture fused silica glass is of great significance. Currently, the popular characterization method for detecting the low damage threshold defects is via measuring the optical absorption of a fused silica glass using the surface thermal lensing technology. However the detecting area of a single shot in this method is too small, typically around 10×10 microns, so if a large aperture fused silica glass in the size of 400×400 mm is to be measured, it would take approximate 100000 hours to complete the measurement, which is obviously not acceptable. Here, we report a fast measurement technique for obtaining the low damage threshold defects in a large aperture fused silica glass according to its fingerprint spectrum, for the fused silica optical glass in the size of 400×400 mm, measurement of the low damage threshold defects in the whole surface in several hours is achievable.

Paper Details

Date Published: 8 July 2019
PDF: 6 pages
Proc. SPIE 11063, Pacific Rim Laser Damage 2019: Optical Materials for High-Power Lasers, 110630Y (8 July 2019); doi: 10.1117/12.2539370
Show Author Affiliations
Shenghao Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Lingqiao Li, Shanghai Institute of Optics and Fine Mechanics (China)
Zhan Sui, China Academy of Engineering Physics (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)
Anhui Province Key Lab. of Non-Destructive Evaluation (China)
Shijie Liu, Shanghai Institute of Optics and Fine Mechanics (China)
Zhouling Wu, ZC Optoelectronic Technologies, Ltd. (China)
Anhui Province Key Lab. of Non-Destructive Evaluation (China)
Jian Chen, ZC Optoelectronic Technologies, Ltd. (China)
Anhui Province Key Lab. of Non-Destructive Evaluation (China)
Ming Huang, ZC Optoelectronic Technologies, Ltd. (China)
Anhui Province Key Lab. of Non-Destructive Evaluation (China)


Published in SPIE Proceedings Vol. 11063:
Pacific Rim Laser Damage 2019: Optical Materials for High-Power Lasers
Jianda Shao; Takahisa Jitsuno; Wolfgang Rudolph, Editor(s)

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