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ASML NXE pellicle update
Author(s): Derk Brouns; Par Broman; Jan-Willem van der Horst; Raymond Lafarre; Raymond Maas; Theo Modderman; Roel Notermans; Guido Salmaso
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Paper Abstract

Over the past years, ASML has taken the NXE pellicle concept (2015) from the concept level to pilot production (2016) and subsequently to a final product (2017 and onwards). In this paper we will show the progress in pellicle development that was made over the past year. After ASML started volume production of pellicles with the previous film generation, a new film generation was introduced end 2018. This new generation of pellicles shows considerable improvements in imaging performance, stability, EUV power capability and EUV reflectivity. The current generation of pellicle films show an EUV power capability of 250 Watts; improvements were also made in the imaging performance, where the EUV reflectivity of the pellicle reduced to below 0.04%. The EUV transmission of the latest pellicles increased to 83%.

Paper Details

Date Published: 27 June 2019
PDF: 6 pages
Proc. SPIE 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 1117806 (27 June 2019); doi: 10.1117/12.2536344
Show Author Affiliations
Derk Brouns, ASML Netherlands B.V. (Netherlands)
Par Broman, ASML Netherlands B.V. (Netherlands)
Jan-Willem van der Horst, ASML Netherlands B.V. (Netherlands)
Raymond Lafarre, ASML Netherlands B.V. (Netherlands)
Raymond Maas, ASML Netherlands B.V. (Netherlands)
Theo Modderman, ASML Netherlands B.V. (Netherlands)
Roel Notermans, ASML Netherlands B.V. (Netherlands)
Guido Salmaso, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 11178:
Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
Akihiko Ando, Editor(s)

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