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Tunable optical properties of uniform and nanostructured TiN thin films
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Paper Abstract

In this work, TiN uniform thin films and nanostructured thin films were fabricated in a magnetron sputtering system. Two sets of TiN thin films with and without substrate bias were deposited at a nitrogen flow rate varied from 1.2 sccm to 2.0 sccm. The permittivity spectra of TiN films were measured and compared between different deposition conditions. A glancing angle-deposited TiN nanorod array was deposited with substrate bias. The polarization dependent extinction versus wavelength and angle of incidence was measured to discuss the associated transverse and longitudinal plasmonic modes.

Paper Details

Date Published: 3 September 2019
PDF: 7 pages
Proc. SPIE 11089, Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI, 110892S (3 September 2019); doi: 10.1117/12.2535680
Show Author Affiliations
Yi-Jun Jen, National Taipei Univ of Technology (Taiwan)
Meng-Jie Lin, National Taipei Univ of Technology (Taiwan)
Ming-Zheng Li, National Taipei Univ of Technology (Taiwan)
Ming-Yang Cong, National Taipei Univ of Technology (Taiwan)


Published in SPIE Proceedings Vol. 11089:
Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI
Balaji Panchapakesan; André-Jean Attias, Editor(s)

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