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A method of polarization-mode conversion based on birefringent film in immersion lithographic illumination system
Author(s): Ruyi Zhou; Linglin Zhu; Tiecheng Liu; Chong Zhang; Aijun Zeng; Huijie Huang; Sergey Avakaw
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Paper Abstract

In immersion lithographic illumination system, appropriate polarization illumination can improve the resolution and imaging quality. Thus it is of great significance to realize different polarization-modes. The zero-order half-wave plates are usually used to achieve conversion of different polarization-modes. However, large-diameter zero-order half-wave plate is too thin to manufacture and assembling. This paper presents a polarization-modes conversion method based on birefringent film. The properties of birefringence film is similar to zero-order half-wave plate, and the film is easy to manufacture. Theoretically, it can be estimated that the film thickness is 2.4μm correspond to 180° retardation in 193nm wavelength. The experiment indicates that the 180° birefringent film can convert linear polarization-modes successfully, which verifies the feasibility of the film as a substitute of zero-order half-wave plate in immersion lithographic illumination system. The method solves the problem that it is difficult to manufacture large-diameter zero-order half-wave plates, and provide a reference for the design of lithographic illumination system.

Paper Details

Date Published: 17 May 2019
PDF: 6 pages
Proc. SPIE 11170, 14th National Conference on Laser Technology and Optoelectronics (LTO 2019), 111702U (17 May 2019); doi: 10.1117/12.2533759
Show Author Affiliations
Ruyi Zhou, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Linglin Zhu, Shanghai Institute of Optics and Fine Mechanics (China)
Tiecheng Liu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Chong Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Aijun Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Sergey Avakaw, Co. of KBTEM-OMO Republican Unitary Scientific and Production Enterprise (Belarus)


Published in SPIE Proceedings Vol. 11170:
14th National Conference on Laser Technology and Optoelectronics (LTO 2019)
Jianqiang Zhu; Weibiao Chen; Zhenxi Zhang; Minlin Zhong; Pu Wang; Jianrong Qiu, Editor(s)

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