Share Email Print

Proceedings Paper

Four-wave mixing and photoconductivity properties of two photorefractive polymers
Author(s): Shuoxing Dou; Hong Gao; Jiasen Zhang; P. X. Ye; X. S. Wang; B. W. Zhang; G. Q. He; Y. Cao; H. P. Hong; Z. M. Feng; C. Ye
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Photorefractive four-wave mixing (FWM) and photoconductivity properties of two new polymers are investigated. One polymer is composed of photoconducting poly(n-vinylcarbazole) (PVK), photosensitizing 2,4,7-trinitro-9-fluorenone (TNF), and optically nonlinear 4-(dicyanovinyl)-N.N-diethylaniline (DCVDEA). Its FWM diffraction efficiency and response time as a function of, respectively, electric field and writing intensity have been determined. With an 80 micrometer thick film, a FWM diffraction efficiency of 7.4 by 10-4 has been obtained. The response time of the polymer is as short as 400 ms at a writing intensity of 0.17 W/cm2. Another polymer is composed of PVK, TNF, and 4-N,N-demethyl- 4'-nitrostilbene (DANS). Its photoconductivity and photocarrier generation efficiency have been determined experimentally at different electric fields and wavelengths.

Paper Details

Date Published: 30 September 1996
PDF: 6 pages
Proc. SPIE 2896, Photorefractive Materials, (30 September 1996); doi: 10.1117/12.253237
Show Author Affiliations
Shuoxing Dou, Institute of Physics (China)
Hong Gao, Institute of Physics (China)
Jiasen Zhang, Institute of Physics (China)
P. X. Ye, Institute of Physics (China)
X. S. Wang, Institute of Photographic Chemistry (China)
B. W. Zhang, Institute of Photographic Chamistry (China)
G. Q. He, Institute of Photographic Chemistry (China)
Y. Cao, Institute of Photographic Chemistry (China)
H. P. Hong, Institute of Chemistry (China)
Z. M. Feng, Institute of Chemistry (China)
C. Ye, Institute of Chemistry (China)

Published in SPIE Proceedings Vol. 2896:
Photorefractive Materials
Ratnakar R. Neurgaonkar; Tsutomu Shimura; Peixian Ye, Editor(s)

© SPIE. Terms of Use
Back to Top