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Proceedings Paper

Synchrotron radiation stimulated materials processing and reaction mechanisms
Author(s): Tsuneo Urisu; Yoshiaki Imaizumi; Akitaka Yoshigoe
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Paper Abstract

Synchrotron radiation (SR) stimulated surface process has been actively studied as anew application field of the SR in the last decade. The reaction mechanism study with these surface photochemical process is necessary to make clear the characteristics unique to the SR stimulated process and the develop an essentially new process technology. In situ observation of SR stimulated Si gas source molecular beam epitaxy by infrared reflection absorption spectroscopy and SR irradiation effects on the dimenthylalumium hydride condensed layer by x-ray photoelectron spectroscopy suggest the potential important of the site specific chemical reaction in the condensed system induced by the core electron excitations. A new process technique, selective core electron excitation process using a monochromatized SR beam, is proposed.

Paper Details

Date Published: 30 September 1996
PDF: 9 pages
Proc. SPIE 2888, Laser Processing of Materials and Industrial Applications, (30 September 1996); doi: 10.1117/12.253111
Show Author Affiliations
Tsuneo Urisu, Institute for Molecular Science (Japan)
Yoshiaki Imaizumi, Graduate Univ. for Advanced Studies (Japan)
Akitaka Yoshigoe, Graduate Univ. for Advanced Studies (Japan)


Published in SPIE Proceedings Vol. 2888:
Laser Processing of Materials and Industrial Applications
Shu-Sen Deng; S. C. Wang, Editor(s)

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