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Proceedings Paper

Study of Ti:sapphire layers created by PLD
Author(s): Miroslav Jelinek; Robert William Eason; Jan Lancok; Andrew A. Anderson; Christos Grivas; Costas Fotakis; Lubomir Jastrabik; Francois Flory
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Paper Abstract

Thin films of Ti:sapphire were fabricated by KrF laser ablation on (0001) and (1102) sapphire, on (001) quartz and on fused silica substrates from crystalline Ti:sapphire targets. Substrates were heated during the deposition at low temperatures or at high temperatures. Films luminescence, crystallinity, fluorescence lifetime, dopants content, waveguiding and surface morphology of created Ti:sapphire films were studied. Results are presented and discussed.

Paper Details

Date Published: 30 September 1996
PDF: 9 pages
Proc. SPIE 2888, Laser Processing of Materials and Industrial Applications, (30 September 1996); doi: 10.1117/12.253103
Show Author Affiliations
Miroslav Jelinek, Institute of Physics (Czech Republic)
Robert William Eason, Univ. of Southampton (United Kingdom)
Jan Lancok, Institute of Physics (Czech Republic)
Andrew A. Anderson, Univ. of Southampton (United Kingdom)
Christos Grivas, Foundation for Research and Technology (Greece)
Costas Fotakis, Foundation for Research and Technology (Greece)
Lubomir Jastrabik, Institute of Physics (Czech Republic)
Francois Flory, Ecole Nationale Superieure de Physique Marseille (France)

Published in SPIE Proceedings Vol. 2888:
Laser Processing of Materials and Industrial Applications
Shu-Sen Deng; S. C. Wang, Editor(s)

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