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Proceedings Paper

Scanning mirror uniformity optimum control
Author(s): Congliang Guo
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Paper Abstract

Scanning mirror uniformity directly effects the exposure area of exposure sample in the chamber of soft x-ray lithography beamline and station. The exposure uniformity control system consists of a scanning mirror, an in-situ Moire fringe grating system, a coupling glass fiber and a silicon photodiode, a high speed A/D interface and on-line microcomputer. Our main study is how to measure uniformity signal finest and how to transfer signal data into computer on-line fast enough. The required driving variation is programmed by a single piece computer which communicates with an IBM PC computer used to control main systems of lithography beamline. The system works so well in HESYRL. But the exposure uniformity is relative to stepping motor vibration frequency. it is not so easy to find a good frequency to get exposure uniformity as best as the system does. In this paper we will discuss on-line real control system in lithography beamline and its basic character. Some results analyzed and new ideas will have more potential prospects on industry application and other applications.

Paper Details

Date Published: 3 October 1996
PDF: 6 pages
Proc. SPIE 2899, Automated Optical Inspection for Industry, (3 October 1996); doi: 10.1117/12.253016
Show Author Affiliations
Congliang Guo, Univ. of Science and Technology of China (China)

Published in SPIE Proceedings Vol. 2899:
Automated Optical Inspection for Industry
Frederick Y. Wu; Shenghua Ye, Editor(s)

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