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Topological Weyl materials for active epsilon-and-mu-near-zero nanophotonics (Conference Presentation)
Author(s): Ortwin Hess

Paper Abstract

Metamaterial theory provides the ability to engineer a custom designed photonic background, which in combination with topological protection will be robust with respect to fluctuations through the intrinsic non-linearity, fabrication imperfections, and thermal noise. We link our recently established group-theoretical approach for topological Weyl materials with a novel quantum-Maxwell-Bloch simulation platform to design and characterise a topologically protected fully three-dimensional epsilon-and-mu-near-zero (phase-locked) nano-plasmonic background for photons. This opens up unique opportunities to achieve optical coherence of quantum emitters at room temperature and to design new lasing states and strong coupling of photon emitters in innovative environments with topological protection against nanoscale structural material disorder.

Paper Details

Date Published: 9 September 2019
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Proc. SPIE 11081, Active Photonic Platforms XI, 110810P (9 September 2019); doi: 10.1117/12.2529620
Show Author Affiliations
Ortwin Hess, Imperial College London (United Kingdom)


Published in SPIE Proceedings Vol. 11081:
Active Photonic Platforms XI
Ganapathi S. Subramania; Stavroula Foteinopoulou, Editor(s)

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