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Transfer of autocollimator calibration for use with scanning gantry profilometers for accurate determination of surface slope and curvature of state-of-the-art x-ray mirrors (Conference Presentation)

Paper Abstract

X-ray optics used to preserve the coherence of free-electron-laser (FEL) and diffraction-limited-storage-ring (DLSR) light sources must have almost perfect surfaces. To accurately characterize such optics, slope profilometers must be nearly free of systematic errors. Where autocollimators may be calibrated at facilities such as PTB, this is for a particular distance and aperture configuration that does not always match the exact use in a scanning profiler. Here we present the configuration and results of transferring the calibration of one reference autocollimator to the scanning autocollimator with particular aperture assemblies used to scan x-ray mirror surfaces. In this way, we may be more confident in the results of the determined low frequency curvature of the mirror, and not ‘print into’ measurements the periodic systematic error of autocollimators, and thus have a better measure with which to predict beamline performance and set for optimal usage. This work was supported by the U. S. Department of Energy under contract number DE-AC02-05CH11231.

Paper Details

Date Published: 9 September 2019
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Proc. SPIE 11109, Advances in Metrology for X-Ray and EUV Optics VIII, 1110905 (9 September 2019); doi: 10.1117/12.2529519
Show Author Affiliations
Ian Lacey, Lawrence Berkeley National Lab. (United States)
Kevan Anderson, Lawrence Berkeley National Lab. (United States)
Jeff M. Dickert, Lawrence Berkeley National Lab. (United States)
Ralf D. Geckeler, Physikalisch-Technische Bundesanstalt (Germany)
Andreas Just, Physikalisch-Technische Bundesanstalt (Germany)
Frank Siewert, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
Brian V. Smith, Lawrence Berkeley National Lab. (United States)
Valeriy V. Yashchuk, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 11109:
Advances in Metrology for X-Ray and EUV Optics VIII
Lahsen Assoufid; Haruhiko Ohashi; Anand Asundi, Editor(s)

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