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Machine learning robot polishing cell
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Paper Abstract

The quality of optical components such as lenses or mirrors can be described by shape errors and surface roughness. With increasing optic sizes, the stability of the polishing process becomes more and more important. Parameters such as chemical stability of the slurry or tool wear are key elements for a deterministic computer controlled polishing (CCP) process. High sophisticated CCP processes such as magnetorheological finishing (MRF) or the ZEEKO bonnet polishing process rely on the stability of the relevant process parameters for the prediction of the desired material removal. Aim of this work is to monitor many process-relevant parameters by using sensors attached to the polishing head and to the polishing process. Examples are a rpm and a torque sensor mounted close to the polishing pad, a vibration sensor for the oscillation of the bearings, as well as a tilt sensor and a force sensor for measuring the polishing pressure. By means of a machine learning system, predictions of tool wear and the related surface quality shall be made. Goal is the detection of the critical influence factors during the polishing process and to have a kind of predictive maintenance system for tool path planning and for tool change intervals.

Paper Details

Date Published: 28 June 2019
PDF: 6 pages
Proc. SPIE 11171, Sixth European Seminar on Precision Optics Manufacturing, 1117102 (28 June 2019); doi: 10.1117/12.2525529
Show Author Affiliations
Max Schneckenburger, Hochschule Aalen - Technik und Wirtschaft (Germany)
Luis Garcia, Hochschule Aalen - Technik und Wirtschaft (Germany)
Rainer Boerret, Hochschule Aalen - Technik und Wirtschaft (Germany)


Published in SPIE Proceedings Vol. 11171:
Sixth European Seminar on Precision Optics Manufacturing
Rolf Rascher; Christian Schopf, Editor(s)

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