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The properties of zirconia during the fused silica polishing process
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Paper Abstract

In this paper, the polishing properties of the zirconia slurry on the fused silica were studied, comparing with the effect of the ceria polishing. The polyurethane without dopant was applied as polishing pad. The experiment results show that it is easier to produce surface scratches when compared with ceria polishing owing to the high Mohs hardness of zirconia. The surface roughness(Rq) of the workpiece was less than 1nm after polishing with submicron size polishing slurry and suitable polishing pad. The R-on-1 test of 355 nm laser-induced damage threshold for fused silica show that zirconia polishing performance is 3.02% higher, however the exposed subsurface damages with HF etching were more than ceria polishing.The subsurface defect density is 0.10def/cm2 (@1μm)with ceria polishing and 1.19def/cm2 (@1μm)with zirconia polishing. Based on the fine polishing performance and abundant resources in nature, the zirconia slurry may be an alternative for fused silica polishing in prospect with the appropriate technological solution.

Paper Details

Date Published: 10 May 2019
PDF: 7 pages
Proc. SPIE 11068, Second Symposium on Novel Technology of X-Ray Imaging, 110680V (10 May 2019); doi: 10.1117/12.2523929
Show Author Affiliations
Shijie Zhao, Research Ctr. of Laser Fusion (China)
Ruiqing Xie, Research Ctr. of Laser Fusion (China)
Xianhua Chen, Research Ctr. of Laser Fusion (China)
Defeng Liao, Research Ctr. of Laser Fusion (China)
Zhigang Yuan, Research Ctr. of Laser Fusion (China)
Jian Wang, Research Ctr. of Laser Fusion (China)


Published in SPIE Proceedings Vol. 11068:
Second Symposium on Novel Technology of X-Ray Imaging
Yangchao Tian; Tiqiao Xiao; Peng Liu, Editor(s)

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