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Edge placement error and line edge roughness
Author(s): Vassilios Constantoudis; George Papavieros; Evangelos Gogolides
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Paper Abstract

The aim of this work is to clarify the quantitative relationship between the Edge Placement Error (EPE) and Line Edge Roughness (LER) in a rough pattern. Using a computational modelling approach to isolate this relationship, we show that despite the dominant role of Rms(LER), EPE is also affected by the correlation length especially at long length of interests. Similarly, we demonstrate and quantify the positive correlation of the edge correlation coefficient with Image Placement Error. The ultimate concern is to get design-rule determinations based on EPE definitions and characterization which is informed by modern manufacturing and metrology aspects of LER.

Paper Details

Date Published: 26 March 2019
PDF: 7 pages
Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109591F (26 March 2019); doi: 10.1117/12.2523419
Show Author Affiliations
Vassilios Constantoudis, Institute of Nanoscience and Nanotechnology (Greece)
Nanometrisis p.c. (Greece)
George Papavieros, Institute of Nanoscience and Nanotechnology (Greece)
Nanometrisis p.c. (Greece)
Aristotle Univ. of Thessaloniki (Greece)
Evangelos Gogolides, Institute of Nanoscience and Nanotechnology (Greece)
Nanomatrisis p.c. (Greece)


Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)

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