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EUV/X-ray Hartmann wavefront sensors and adaptive optics at Imagine Optic (Conference Presentation)
Author(s): Ombeline de La Rochefoucauld; Samuel Bucourt; Daniele Cocco; Guillaume Dovillaire; Fabrice Harms; Mourad Idir; Dietmar Korn; Xavier Levecq; Martin Piponnier; Rakchanok Rungsawang; Lorenzo Raimondi; Philippe Zeitoun
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Paper Abstract

Since its creation in 1996, Imagine Optic designed and manufactured high performance Shack-Hartmann wavefront (WF) sensors for many kinds of applications such as telescope alignment, laser characterization, optics qualification or adaptive optics, and for many different fields such as space optics, microscopy, high power lasers or lithography. Since 2003, Imagine Optic is actively developing EUV to X-ray Hartmann WF sensors for applications on metrology beams emitted by synchrotrons, free-electron lasers, plasma-based soft X-ray lasers and high harmonic generation. Our most recent developments include the realization of a EUV sensor adapted to strongly convergent or divergent beams having numerical aperture as high as 0.15, as well as the production of a hard X-ray sensor working above 10 keV, providing outstanding repeatability as good as 4 pm rms. Our sensors have demonstrated their high usefulness for the metrology of EUV to X-ray optics from single flat or curved mirrors to more complex optical systems (Schwarzschild, Kirkpatrick-Baez static or based on bender technology or with activators). In terms of optics qualification is a clear advantage of actually measuring the wavefront at-wavelength. Also, we show active Kirkpatrick-Baez alignment in few minutes using our WF sensor in both manual and automatic loops at the benefit of strong improvement of the beam focalization on the sample. Recently we started developing our own compact deformable grazing incidence mirror bender. We present a review of the developed sensors, as well as experimental demonstrations of their benefits for optical metrology of various EUV and X-ray optics.

Paper Details

Date Published: 13 May 2019
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Proc. SPIE 11032, EUV and X-ray Optics: Synergy between Laboratory and Space VI, 1103207 (13 May 2019); doi: 10.1117/12.2522510
Show Author Affiliations
Ombeline de La Rochefoucauld, Imagine Optic SA (France)
Samuel Bucourt, Imagine Optic SA (France)
Daniele Cocco, SLAC National Accelerator Lab. (United States)
Guillaume Dovillaire, Imagine Optic SA (France)
Fabrice Harms, Imagine Optic SA (France)
Mourad Idir, Brookhaven National Lab. (United States)
National Synchrotron Light Source II (United States)
Dietmar Korn, Imagine Optic SA (France)
Xavier Levecq, Imagine Optic SA (France)
Martin Piponnier, Imagine Optic SA (France)
Rakchanok Rungsawang, Imagine Optic SA (France)
Lorenzo Raimondi, Elettra-Sincrotrone Trieste S.C.p.A. (Italy)
Philippe Zeitoun, Lab. d'Optique Appliquée (France)


Published in SPIE Proceedings Vol. 11032:
EUV and X-ray Optics: Synergy between Laboratory and Space VI
René Hudec; Ladislav Pina, Editor(s)

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