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Study on broadening of Na D1 and D2 lines spectra in sodium-argon mixture
Author(s): Shu Hu; Baodong Gai; Xusheng Xia; Dong Liu; Xianglong Cai; Hong Yuan; Shan He; Hui Li; Jinbo Liu; Pengyuan Wang; Ying Chen; Zhonghui Li; Jingwei Guo
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Paper Abstract

After the multiphoton ionization of sodium-argon mixture, time-resolved atomic emission spectrum is used to experimentally study the unusual phenomenon of the obviously different broadening between Na D1 and D2 lines spectra. The primary reason for the unusual broadening of Na D2 line is that the spectral line of Ar I 588.9 nm overlays with Na D2 line (589.0 nm) after ionization, and the serious self-absorption on Na D2 line is the secondary reason. Although there is difference of population between 32P3/2 and 32P1/2 states, the experiment result demonstrates that the difference between Na D lines in radiation channel will not affect the broadening of spectral profile.

Paper Details

Date Published: 3 January 2019
PDF: 6 pages
Proc. SPIE 11042, XXII International Symposium on High Power Laser Systems and Applications, 110420G (3 January 2019); doi: 10.1117/12.2522100
Show Author Affiliations
Shu Hu, Dalian Institute of Chemical Physics (China)
Baodong Gai, Dalian Institute of Chemical Physics (China)
Xusheng Xia, Dalian Institute of Chemical Physics (China)
Univ. of Chinese Academy of Sciences (China)
Dong Liu, Dalian Institute of Chemical Physics (China)
Xianglong Cai, Dalian Institute of Chemical Physics (China)
Hong Yuan, Dalian Institute of Chemical Physics (China)
Univ. of Chinese Academy of Sciences (China)
Shan He, Dalian Institute of Chemical Physics (China)
Univ. of Chinese Academy of Sciences (China)
Hui Li, Dalian Institute of Chemical Physics (China)
Jinbo Liu, Dalian Institute of Chemical Physics (China)
Pengyuan Wang, Dalian Institute of Chemical Physics (China)
Ying Chen, Dalian Institute of Chemical Physics (China)
Zhonghui Li, Dalian Institute of Chemical Physics (China)
Jingwei Guo, Dalian Institute of Chemical Physics (China)


Published in SPIE Proceedings Vol. 11042:
XXII International Symposium on High Power Laser Systems and Applications
Paolo Di Lazzaro, Editor(s)

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