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Formation features and electrophysical properties of ferroelectric films ZnO study
Author(s): A. O. Zotov; A. A. Perevalov; V. I. Shevyakov; A. N. Belov
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Paper Abstract

The work is devoted to the study of the formation of zinc oxide films in four different ways: by magnetron sputtering, deposition from the gas phase, by dip-coating, and by atomic layer deposition. The effect of alloying additives of subsequent thermal annealing on the morphology and electrical conductivity of the films obtained is reflected. It has been established that the smallest roughness of films is obtained when films are deposited by atomic layer deposition.

Paper Details

Date Published: 15 March 2019
PDF: 7 pages
Proc. SPIE 11022, International Conference on Micro- and Nano-Electronics 2018, 110221D (15 March 2019); doi: 10.1117/12.2521973
Show Author Affiliations
A. O. Zotov, National Research Univ. of Electronic Technology (Russian Federation)
A. A. Perevalov, National Research Univ. of Electronic Technology (Russian Federation)
V. I. Shevyakov, National Research Univ. of Electronic Technology (Russian Federation)
A. N. Belov, National Research Univ. of Electronic Technology (Russian Federation)


Published in SPIE Proceedings Vol. 11022:
International Conference on Micro- and Nano-Electronics 2018
Vladimir F. Lukichev; Konstantin V. Rudenko, Editor(s)

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