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Photoluminescence properties and characterization of LiF-based imaging detector irradiated by 10 keV XFEL beam
Author(s): F. Bonfigli; N. J. Hartley; Y. Inubushi; M. Koenig; T. Matsuoka; S. Makarov; R. M. Montereali; E. Nichelatti; N. Ozaki; M. Piccinini; S. Pikuz; T. Pikuz; D. Sagae; M. A. Vincenti; M. Yabashi; T. Yabuuchi
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Paper Abstract

We present the study of optical and spectral properties of radiation-induced stable point defects, known as color centers (CCs), in lithium fluoride (LiF) for the detection of 10 keV XFEL beam at Spring-8 Angstrom Compact free electron LAser (SACLA) in Japan. A thick LiF crystal was irradiated in four spots with 10 keV XFEL beam (pulse duration = 10 fs) with different number of accumulated shots. After irradiation the colored-LiF spots were characterized with an optical microscope in fluorescence mode and their photoluminescence intensity and spectra were analyzed.

Paper Details

Date Published: 24 April 2019
PDF: 11 pages
Proc. SPIE 11035, Optics Damage and Materials Processing by EUV/X-ray Radiation VII, 110350N (24 April 2019); doi: 10.1117/12.2520907
Show Author Affiliations
F. Bonfigli, Ctr. Ricerche Frascati, ENEA (Italy)
N. J. Hartley, Osaka Univ. (Japan)
Helmholtz-Zentrum Dresden-Rossendorf (Germany)
Y. Inubushi, RIKEN Spring-8 Ctr. (Japan)
M. Koenig, Osaka Univ. (Japan)
Ecole Polytechnique (France)
T. Matsuoka, Osaka Univ. (Japan)
S. Makarov, Joint Institute for High Temperatures (Russian Federation)
M.V. Lomonosov Moscow State Univ. (Russian Federation)
R. M. Montereali, Ctr. Ricerche Frascati, ENEA (Italy)
E. Nichelatti, Ctr. Ricerche Frascati, ENEA (Italy)
N. Ozaki, Osaka Univ. (Japan)
M. Piccinini, Ctr. Ricerche Frascati, ENEA (Italy)
S. Pikuz, Joint Institute for High Temperatures (Russian Federation)
T. Pikuz, Osaka Univ. (Japan)
Joint Institute for High Temperatures (Russian Federation)
D. Sagae, Osaka Univ. (Japan)
M. A. Vincenti, Ctr. Ricerche Frascati, ENEA (Italy)
M. Yabashi, RIKEN Spring-8 Ctr. (Japan)
T. Yabuuchi, RIKEN Spring-8 Ctr. (Japan)


Published in SPIE Proceedings Vol. 11035:
Optics Damage and Materials Processing by EUV/X-ray Radiation VII
Libor Juha; Saša Bajt; Stéphane Guizard, Editor(s)

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