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Methods and means of experimental investigation of gas-phase deposition of material layers in MEMS processes
Author(s): V. Samoylikov; S. Evstafyev
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Paper Abstract

This paper considers methods and means of experimental investigation of gas-phase deposition of layers of different materials realized in CVD and LPCVD technologies. The need to obtain layers of a given composition and parameters requires careful studies of the physical and chemical laws of such processes. As shown by the analysis of literary sources, most of the available works on these topics are performed on the basis of various computer software tools and results and conclusions represent a large set of particular cases, since a particular design of the reactor with specific geometric parameters is being investigated. In our opinion, the creation of analytical models of gas-phase deposition processes is an important component of a comprehensive study of gas-phase processes and for such purpose in this paper we present a methodological basis for the studies of CVD and LPCVD processes: a technique for visualizing the interaction of the ASG flow with the deposition surface (substrates), a technique based on the effect of self-doping and methods of physical and analog modeling.

Paper Details

Date Published: 15 March 2019
PDF: 6 pages
Proc. SPIE 11022, International Conference on Micro- and Nano-Electronics 2018, 110221S (15 March 2019); doi: 10.1117/12.2520521
Show Author Affiliations
V. Samoylikov, National Research Univ. of Electronic Technology (Russian Federation)
S. Evstafyev, National Research Univ. of Electronic Technology (Russian Federation)


Published in SPIE Proceedings Vol. 11022:
International Conference on Micro- and Nano-Electronics 2018
Vladimir F. Lukichev; Konstantin V. Rudenko, Editor(s)

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