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Proceedings Paper • new

Dual-mode snapshot interferometric system for on-machine metrology (Conference Presentation)
Author(s): Xiaobo Tian; Alexander Sohn; Yu Zhang; Oliver Spires; Rongguang Liang
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Paper Abstract

We present a dual-mode snapshot interferometric system (DMSIS) for measuring both surface shape and surface roughness to meet the urgent need for on-machine metrology in optical fabrication. Two different modes, interferometer mode and microscopy mode, are achieved using Linnik configuration. To realize snapshot measurement, a pixelated polarization camera is used to capture four phase-shifted interferograms simultaneously. We have demonstrated its performance for off-line metrology and on-machine metrology by mounting it on a diamond turning machine.

Paper Details

Date Published: 13 May 2019
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Proc. SPIE 10991, Dimensional Optical Metrology and Inspection for Practical Applications VIII, 109910P (13 May 2019); doi: 10.1117/12.2518689
Show Author Affiliations
Xiaobo Tian, The Univ. of Arizona (United States)
Alexander Sohn, Oculus VR, LLC (United States)
Yu Zhang, Northeast Electric Power Univ. (China)
Oliver Spires, The Univ. of Arizona (United States)
Rongguang Liang, The Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 10991:
Dimensional Optical Metrology and Inspection for Practical Applications VIII
Kevin G. Harding; Song Zhang, Editor(s)

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