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Proceedings Paper

Analysis of near-field holographic pattern formation using phase masks
Author(s): Genxiang Chen; Shuisheng Jian; Ling Yang; Xun Li; Huang Ge; Wei Wang
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Paper Abstract

The near-field holographic interference patterns of phase masks irradiated by excimer lasers is analyzed in details theoretically in this paper. The interference intensity patterns produced by periodic phase masks are calculated using scalar diffraction modeling with various assumptions of mask parameters.

Paper Details

Date Published: 23 September 1996
PDF: 6 pages
Proc. SPIE 2885, Holographic Optical Elements and Displays, (23 September 1996); doi: 10.1117/12.251862
Show Author Affiliations
Genxiang Chen, Northern Jiaotong Univ. (China)
Shuisheng Jian, Northern Jiaotong Univ. (China)
Ling Yang, Northern Jiaotong Univ. (China)
Xun Li, Univ. of Waterloo (Canada)
Huang Ge, Institute of Semiconductors (China)
Wei Wang, Institute of Semiconductors (China)


Published in SPIE Proceedings Vol. 2885:
Holographic Optical Elements and Displays
Freddie Shing-Hong Lin; Daxiong Xu, Editor(s)

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