Share Email Print

Proceedings Paper

Fabrication of fused silica phase masks by reactive ion etching
Author(s): Genxiang Chen; Shuisheng Jian; Ling Yang; Xun Li; Meiqiao Cheng; Yaqing Zhu; Li Li; Huang Ge; Wei Wang
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A novel method for producing durable fused silica self- interference phase grating photomasks is described in this paper. The gratin pattern is formed into AZ-1350 photoresist by 325nm He-Cd laser optical holographic exposure and is transferred to a thin metal layer via focused ion beam lithography, then reactive ion etching in CHF3/O2 plasma is used to etch the fused silica substrate. Inspection performed by scanning electron microscopy shows that fabricated silica phase masks are perfect and no reactive deposition is formed int he grating grooves.

Paper Details

Date Published: 23 September 1996
PDF: 5 pages
Proc. SPIE 2885, Holographic Optical Elements and Displays, (23 September 1996); doi: 10.1117/12.251861
Show Author Affiliations
Genxiang Chen, Northern Jiaotong Univ. (China)
Shuisheng Jian, Northern Jiaotong Univ. (China)
Ling Yang, Northern Jiaotong Univ. (China)
Xun Li, Univ. of Waterloo (Canada)
Meiqiao Cheng, Institute of Semiconductors (China)
Yaqing Zhu, Institute of Semiconductors (China)
Li Li, Institute of Semiconductors (China)
Huang Ge, Institute of Semiconductors (China)
Wei Wang, Northern Jiaotong Univ. (China)

Published in SPIE Proceedings Vol. 2885:
Holographic Optical Elements and Displays
Freddie Shing-Hong Lin; Daxiong Xu, Editor(s)

© SPIE. Terms of Use
Back to Top