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Microstructure and optical properties of black silicon layers
Author(s): Stanislav Jurečka; Martin Králik; Emil Pinčík; Kentaro Imamura; Taketoshi Matsumoto; Hikaru Kobayashi
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Paper Abstract

Black silicon structures were formed by etching of silicon substrates based on the surface structure chemical transfer method. Formed structures show gradient of material density in the nanocrystalline Si layer leading to ultralow spectral reflectance below 3% in wide spectral region. In study of the development of microstructure properties during the forming procedure the TEM images were used. Information abut the microstructure observed in the TEM images was analysed by the Abbott-Firestone method. By using this approach limiting conditions for the black silicon layer formation were obtained. Spectral reflectances of studied samples were modelled by using the effective medium theory. Multilayer theoretical model based on splitting the black silicon layer into 20 sublayers was constructed. Optical properties of each individual sublayer were described by using Bruggeman effective media theory combining Si, SiO2 and void fractions. Gradual development of real and imaginary part of complex index of refraction was observed in the volume of black silicon layers. Results of optical analysis correspond to the microstructure development during sample forming.

Paper Details

Date Published: 18 December 2018
PDF: 6 pages
Proc. SPIE 10976, 21st Czech-Polish-Slovak Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 109760I (18 December 2018); doi: 10.1117/12.2518368
Show Author Affiliations
Stanislav Jurečka, Univ. of Žilina (Slovakia)
Martin Králik, Univ. of Žilina (Slovakia)
Emil Pinčík, Institute of Physics (Slovakia)
Kentaro Imamura, Osaka Univ. (Japan)
Taketoshi Matsumoto, Osaka Univ. (Japan)
Hikaru Kobayashi, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 10976:
21st Czech-Polish-Slovak Optical Conference on Wave and Quantum Aspects of Contemporary Optics
Pavel Zemánek, Editor(s)

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