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Proceedings Paper

Process of double-exposure interferogram formation on deformed surface of photothermoplastic media
Author(s): Lev M. Panasiuk; Igor V. Ciapurin
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Paper Abstract

The study of double-exposure interferogram recording onto photothermoplastic media (PTPM) is carried out and the results are given. The peculiarities of surface relief development arising during the recording process with two charging cycles are determined. The practical recommendations are given to optimize the process of double-exposure interferogram recording onto PTPM.

Paper Details

Date Published: 30 September 1996
PDF: 8 pages
Proc. SPIE 2851, Photopolymer Device Physics, Chemistry, and Applications III, (30 September 1996); doi: 10.1117/12.251830
Show Author Affiliations
Lev M. Panasiuk, State Univ. of Moldova (Moldova)
Igor V. Ciapurin, State Univ. of Moldova (Moldova)


Published in SPIE Proceedings Vol. 2851:
Photopolymer Device Physics, Chemistry, and Applications III
Roger A. Lessard, Editor(s)

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