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Interferometric measurement of phase in EUV masks
Author(s): Wenhua Zhu; Ryan Miyakawa; Lei Chen; Patrick Naulleau
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Paper Abstract

In this paper we present a technique for measuring the phase of EUV phase shift masks. In this technique we image the mask with a specialized objective lens that generates a superposition of two laterally separated images that interfere onto a detector. The resulting interference contains information about both the amplitude and the phase of the mask. By changing the incident illumination angle, we can control the bulk phase of the interference fringes, which allows us to reconstruct the phase difference between two adjacent points on the mask using standard phase retrieval techniques. While this method only reconstructs phase differences, it can be used to fully characterize the amplitude and phase of features provided that they are adjacent to a flat reference area on the mask.

Paper Details

Date Published: 4 June 2019
PDF: 7 pages
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109571W (4 June 2019); doi: 10.1117/12.2518057
Show Author Affiliations
Wenhua Zhu, Nanjing Univ. of Science and Technology (China)
Lawrence Berkeley National Lab. (United States)
Ryan Miyakawa, Lawrence Berkeley National Lab. (United States)
Lei Chen, Nanjing Univ. of Science and Technology (China)
Patrick Naulleau, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 10957:
Extreme Ultraviolet (EUV) Lithography X
Kenneth A. Goldberg, Editor(s)

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