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Progress on sub-wavelength nanoimaging with a coherent tabletop EUV source (Conference Presentation)
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Paper Abstract

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Paper Details

Date Published: 26 March 2019
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Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109590W (26 March 2019); doi: 10.1117/12.2517026
Show Author Affiliations
Charles S. Bevis, JILA (United States)
Robert Karl Jr., JILA (United States)
Bin Wang, JILA (United States)
Peter Johnsen, JILA (United States)
Michael Tanksalvala, JILA (United States)
Christina Porter, JILA (United States)
Yuka Esashi, JILA (United States)
Henry Kapteyn, JILA (United States)


Published in SPIE Proceedings Vol. 10959:
Metrology, Inspection, and Process Control for Microlithography XXXIII
Vladimir A. Ukraintsev; Ofer Adan, Editor(s)

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