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New horizons in laser material processing: how OCT sets new standards
Author(s): Markus Kogel-Hollacher; Stephan André; Tobias Beck
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Paper Abstract

Laser materials processing, e.g. welding/ additive manufacturing with cw sources or surface modification with short and ultra-short pulsed lasers is a highly dynamic process, requiring a sensor with high temporal and spatial resolution for evaluating the result of the treatment. Especially in the context of Industry 4.0, digitalization and predictive maintenance reliable sensors get much more into focus. A major drawback of this photon-material interaction with respect to the acquisition of trustworthy measurement data from the interaction zone is the presence of intense process emissions and steep temperature gradients. Common devices used as sensors for process monitoring, like CMOS/IR cameras or photo diodes, help to get an idea of the resulting quality but the acquired data is always perturbed by hot vapor emerging from the workpiece surface. Sensors based on OCT/ low coherence interferometry are different to all the other technologies because the measurement is not affected by the process emissions and thus open new horizons in laser materials processing. The use of this method in laser applications has risen in the last years. Since its first appearance in 2008 [1], application examples were shown for laser cutting [2], selective laser melting [3], laser micro machining [4], laser drilling [5] and laser welding [6]. For the latter, a huge potential is foreseen [8].

Paper Details

Date Published: 27 February 2019
PDF: 11 pages
Proc. SPIE 10911, High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VIII, 109110F (27 February 2019); doi: 10.1117/12.2516967
Show Author Affiliations
Markus Kogel-Hollacher, Precitec Optronik GmbH (Germany)
Stephan André, Precitec Optronik GmbH (Germany)
Tobias Beck, Precitec Optronik GmbH (Germany)


Published in SPIE Proceedings Vol. 10911:
High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VIII
Stefan Kaierle; Stefan W. Heinemann, Editor(s)

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