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Oxygen effects in thin films for high-resolution , 3-color lithography
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Paper Abstract

Three-color lithography (3CL) produces features on the scale of tens of nanometers using visible light. In this technique, one beam pre-activates a photoresist, a second beam deactivates it, and a third beam activates the pre-activated regions that have not been deactivated. The deactivation beam trims features, allowing for improved feature size and resolution. Creating permeable thin films enables us to further control feature size using oxygen as a quencher. We will discuss these thin-film studies, which are a promising step towards large-area patterning.

Paper Details

Date Published: 26 March 2019
PDF: 7 pages
Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 1095814 (26 March 2019); doi: 10.1117/12.2516544
Show Author Affiliations
Sandra A. Gutierrez Razo, Univ. of Maryland, College Park (United States)
Nikolaos Liaros, Univ. of Maryland, College Park (United States)
Adam Pranda, Univ. of Maryland, College Park (United States)
Gottlieb Oehrlein, Univ. of Maryland, College Park (United States)
John T. Fourkas, Univ. of Maryland, College Park (United States)
John Petersen, Univ. of Maryland, College Park (United States)
Periodic Structures, Inc. (United States)


Published in SPIE Proceedings Vol. 10958:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
Martha I. Sanchez; Eric M. Panning, Editor(s)

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