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Proceedings Paper • new

High-resolution femtosecond laser 3D micromachining using low-NA focusing systems
Author(s): Wei Chu; Peng Wang; Lingling Qiao; Wenbo Li; Yuanxin Tan; Ya Cheng
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Paper Abstract

Low-NA focusing systems can offer longer working distances than the high-NA ones, thereby enabling fabrication of 3D structures of great heights/thicknesses. However, degradation of the longitudinal resolution occurs at low NAs as a consequence of diffraction of the light waves. Here, we report on high-resolution laser printing of three dimensional (3D) structures of heights up to a few centimeters with a sub-10 μm longitudinal resolution by incorporating a simultaneous spatiotemporal focusing (SSTF) scheme into the femtosecond laser direct writing. Remarkably, the SSTF can ensure generation of symmetric focal spots (i.e., spherical focal spots) of comparable sizes along both the horizontal and vertical directions. The resolutions are tunable in real time by dynamically varying the power of the writing laser beam. The ability to simultaneous achieving the large heights and high longitudinal resolutions in femtosecond laser 3D micromachining is of great use for applications ranging from microfluidics to infrared and THz photonics.

Paper Details

Date Published: 4 March 2019
PDF: 10 pages
Proc. SPIE 10908, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XIX, 109080B (4 March 2019); doi: 10.1117/12.2516203
Show Author Affiliations
Wei Chu, Shanghai Institute of Optics and Fine Mechanics (China)
Peng Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Lingling Qiao, Shanghai Institute of Optics and Fine Mechanics (China)
Wenbo Li, Shanghai Institute of Optics and Fine Mechanics (China)
Yuanxin Tan, Shanghai Institute of Optics and Fine Mechanics (China)
Ya Cheng, Shanghai Institute of Optics and Fine Mechanics (China)
East China Normal Univ. (China)


Published in SPIE Proceedings Vol. 10908:
Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XIX
Peter R. Herman; Michel Meunier; Roberto Osellame, Editor(s)

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