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Post-polymerization modification of PS-b-PMMA for achieving directed self-assembly with sub-10nm feature size
Author(s): Takuya Isono; Kohei Yoshida; Hiroaki Mamiya; Ken Miyagi; Akiyoshi Yamazaki; Toshifumi Satoh
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Paper Abstract

This paper describes the ester-amide exchange reaction for the facile and efficient post-polymerization modification of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) to produce high-χ/low-N PS-b-PMMA analogues that exhibit a microphase separation with features on a sub-10 nm scale. Various amines were used for the ester-amide exchange reaction to introduce a small number of methacrylamide units into the PMMA block of the parent PS-b- PMMA. A small-angle X-ray scattering analysis revealed that a tiny amount of the methacrylamide units led to a significant increase in the incompatibility between the blocks. Consequently, we obtained a lamellar microphaseseparated structure with a domain-spacing as small as 11.1 nm through the simple post-polymerization modification of low-molecular-weight PS-b-PMMA. More importantly, directed self-assembly for the modified PS-b-PMMAs was demonstrated using topographically prepatterned silicon substrates with a PS brush layer, thus highlighting the practical utility of the proposed method in next generation nanolithographic applications.

Paper Details

Date Published: 25 March 2019
PDF: 8 pages
Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 109600U (25 March 2019); doi: 10.1117/12.2515933
Show Author Affiliations
Takuya Isono, Hokkaido Univ. (Japan)
Kohei Yoshida, Hokkaido Univ. (Japan)
Hiroaki Mamiya, National Institute for Materials Science (Japan)
Ken Miyagi, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Akiyoshi Yamazaki, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Toshifumi Satoh, Hokkaido Univ. (Japan)


Published in SPIE Proceedings Vol. 10960:
Advances in Patterning Materials and Processes XXXVI
Roel Gronheid; Daniel P. Sanders, Editor(s)

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