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Extremely long life excimer laser chamber technology for multi-patterning lithography
Author(s): Hiroaki Tsushima; Yousuke Fujimaki; Yasuaki Kiyota; Makoto Tanaka; Takashi Itou; Takeshi Asayama; Akihiko Kurosu; Satoshi Tanaka; Takeshi Ohta; Satoru Bushida; Takashi Saitou; Hakaru Mizoguchi
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Paper Abstract

Multi-patterning techniques with ArF immersion lithography is expected to continue as main solution for manufacturing IC chips. The reduction of laser downtime has great impact on the productivity of chipmakers. The laser downtime is closely related to the lifetime of consumable parts of the laser. Gigaphoton has developed longer life excimer laser chamber which contains a new technology “New-type G-electrode”. This new type excimer laser chamber demonstrated 1.3 times longer lifetime than conventional excimer laser chamber. Gigaphoton has also introduced new design of LNM (Line Narrowing Module) last year. Through combines timing of maintenance of new type excimer laser chamber and new type LNM, it’s expected that the downtime of the laser is significantly reduced than ever. This leads to the improvement of the throughput on ArFi lithography.

Paper Details

Date Published: 27 March 2019
PDF: 8 pages
Proc. SPIE 10961, Optical Microlithography XXXII, 109610X (27 March 2019); doi: 10.1117/12.2515667
Show Author Affiliations
Hiroaki Tsushima, Gigaphoton, Inc. (Japan)
Yousuke Fujimaki, Gigaphoton, Inc. (Japan)
Yasuaki Kiyota, Gigaphoton, Inc. (Japan)
Makoto Tanaka, Gigaphoton, Inc. (Japan)
Takashi Itou, Gigaphoton, Inc. (Japan)
Takeshi Asayama, Gigaphoton, Inc. (Japan)
Akihiko Kurosu, Gigaphoton, Inc. (Japan)
Satoshi Tanaka, Gigaphoton, Inc. (Japan)
Takeshi Ohta, Gigaphoton, Inc. (Japan)
Satoru Bushida, Gigaphoton, Inc. (Japan)
Takashi Saitou, Gigaphoton, Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton, Inc. (Japan)


Published in SPIE Proceedings Vol. 10961:
Optical Microlithography XXXII
Jongwook Kye; Soichi Owa, Editor(s)

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