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Lithography hotspot candidate detection using coherence map
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Paper Abstract

Lithography hotspot detection and correction in the layout design phase is important to suppress manufacturing yield loss. Although machine learning based hotspot detection methods are considered as effective solutions over conventional lithography simulation, it is still difficult to apply them to practical layout design tasks because of a trade-off between detection accuracy and false alarms. In this paper, we propose a fast, accurate and reliable method to detect lithography hotspot candidates based on coherence map. Experimental results show that our method outperforms typical machine learning based hotspot detection models on industrial benchmark.

Paper Details

Date Published: 20 March 2019
PDF: 8 pages
Proc. SPIE 10962, Design-Process-Technology Co-optimization for Manufacturability XIII, 109620Q (20 March 2019); doi: 10.1117/12.2515664
Show Author Affiliations
Tetsuaki Matsunawa, Toshiba Memory Corp. (Japan)
Taiki Kimura, Toshiba Memory Corp. (Japan)
Shigeki Nojima, Toshiba Memory Corp. (Japan)


Published in SPIE Proceedings Vol. 10962:
Design-Process-Technology Co-optimization for Manufacturability XIII
Jason P. Cain, Editor(s)

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